Used VERTEQ 1600-NSC #9366559 for sale

VERTEQ 1600-NSC is a next generation photoresist equipment that is used to create high precision features in semiconductor and other integrated circuit devices. The system is a full-featured platform that includes a high-precision mask aligner, exposure source, and chemical processing equipment. As a result, it offers a combination of features for improved production capacities, reliability, and cost savings. 1600-NSC features a precise 5-axis mask aligner capable of operating at 0.3 micron precision to ensure high accuracy alignment and control which translates to high-yield parts. The unit also uses a high-frequency lamp exposure source which delivers fast, reliable exposed wafer speed. An advanced photoresist choice allows users the option to choose a resist with desired optical properties which allows for high contrast features. The chemical processing machine within VERTEQ 1600-NSC enables the removal of photoresist in a safe and efficient manner and holds various chemicals for removal such as dry etchants, aqueous based solutions, and inert gases. Furthermore, the tool supports multi-layer process techniques such as deep trench etching or via fill and offers efficient cooling of the wafer to reduce thermal stress during photolithography, polishing, and etching. 1600-NSC is well-suited for precision-based manufacturing such as semiconductor devices. The combination of all the asset components helps to ensure high throughput and short cycle times and ensures the customer is provided with a reliable and versatile model which will reduce the cost of production and improve the overall quality of the parts.