Used VERTEQ 1600 #293810265 for sale

VERTEQ 1600 is a state-of-the-art photoresist equipment designed to facilitate photolithography applications in the semiconductor industry. This system uses a high-intensity ultra-violet light source to accurately expose a photoresist film that functions as an etch mask in the fabrication of submicron circuit elements. The unit features a 4k pixel size and a large 8"x8" resolution mask, allowing for high-quality photolithography performance for exposure of 64 mm x 64 mm substrates. VERTEQ also utilizes a Quad-Wave imaging machine, which provides a high-precision exposure by rotating four exposure light waves with a linear or spiral scanning pattern to reach an extremely high-quality image. The tool is also equipped with a high accuracy control asset to ensure consistent results, and can maintain a tolerance of 7-10 um of x-y position and 25-50nm of focus control with repeatability. It also features a fully automated operating mode, allowing users to program exposure parameters and repetition. 1600 includes a number of safety features, including an interlock model to prevent exposure to UV radiation, a cover to ensure that the wafer is shielded from extraneous light, and a height adjustment sensor to ensure accurate processing. The equipment is designed to be easy to use and maintain, and is compact and lightweight for convenient transport to different fabrication locations. It is also energy efficient, and is designed to minimize the need for costly consumables. Overall, VERTEQ 1600 is an advanced photoresist system that is designed to meet the needs of the advanced semiconductor industry. This unit offers users a number of benefits, including high-precision exposure subsystems, automated operation, user-friendly design, and safety features.