Used VERTEQ 1600 #9219679 for sale

VERTEQ 1600 photoresist equipment is a state-of-the-art tool for fabrication of integrated circuits on a variety of substrates. It is capable of handling wafer sizes ranging from 75 mm to 450 mm in diameter. The system is based on a vertically scanned electron beam (VSEB) lithography process. The unit offers superior resolution and patterning capability down to feature sizes of half micron and beyond. 1600 features an advanced beam control machine (BCS) which allows for precise control of the beam alignment and focus on the wafer surface. This ensures that every pattern produced by the tool is highly accurate and precise. The asset also features a number of other advantageous features, including a built-in optical microscope for alignment, automated calibration routines for all alignment parameters, a fast and precise stage, and a fast and accurate overlay routine. In addition, the model also offers an advanced wafer loading equipment and an intuitive user interface. VERTEQ 1600 uses a variety of standard photoresists in order to facilitate the lithography process. These photoresists can be tailored for use with different types of substrates and processes, allowing for maximum flexibility and precise feature engineering. Furthermore, the system offers various methods of exposure, including laser scanning photolithography and contact lithography. This allows for maximum accuracy when producing features, and ensures that no one exposed region is overpowered by another. Overall, 1600 photoresist unit is a powerful and reliable tool for producing high quality integrated circuits. The advanced beam alignment machine, precise wafer stage, high resolution photoresists, and multiple lithography methods all combine to produce accurate, precise, and repeatable results. This makes VERTEQ 1600 an outstanding choice for high performance microelectronics.