Used VERTEQ 1600 #9226188 for sale

Manufacturer
VERTEQ
Model
1600
ID: 9226188
Wafer Size: 6"
Spin dryer, 6".
VERTEQ 1600 is an advanced photoresist equipment designed for 1.6m x 1.6m substrates. It utilizes a patented HDR (High Dynamic Range) imaging process and its 515nm laser array, enabling optimal imaging accuracy and uniformity across large substrates. Its unique HDR process is capable of faster, cleaner exposures with no halo effects or other image distortion. 1600 has an advanced exposure algorithm to achieve higher resolution imaging and faster shot times for energy-sensitive substrates, while avoiding substrate distortion and pinholes. It also utilizes an enclosed 318nm UV source chamber for maximum image consistency, and a 180-micron minimum resolution for precision lithographic processing. VERTEQ 1600 features an automated substrate alignment system, allowing for seamless and repeatable batch processing and increased productivity. A user-friendly graphical interface enables easier programmability for job-specific tasks, like correction of bias fields, aperture control, and quantitative resolution and isotropic control. In addition, 1600 supports multiple forms of substrate motion control, allowing it to replicate more complex patterns than traditional systems. The wide range of processes and functions make VERTEQ 1600 a versatile tool for all types of applications. It is ideal for both experimental development and production processes, and is widely used in the manufacture of printed circuit boards, flat-panel displays, high-resolution lithography, semiconductor devices, and optical devices. In addition, 1600 is designed for maximum energy efficiency and sustainability, featuring a smart operation unit and no hazardous waste or emissions. This machine is also easily scalable, making it an ideal choice for research, education, and industrial processes.
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