Used VERTEQ 1600 #9226189 for sale

VERTEQ 1600 is an advanced photoresist equipment developed by VERTEQ Corporation for accurate and fast photoresist deposition. This photoresist system is capable of high-throughput resist coating for microelectronic applications. It can dispense precise amounts of photoresist materials to a substrate, layering it in multiple layers in inches per second. 1600 offers excellent throughput for high-volume production, with speeds up to 17 cm2/minute. The unit has variable speed and power control for precise and accurate coating and leveling. This allows users to deliver a uniform thickness of photoresist to the substrate with minimal variability across the area of the substrate. The machine also comes with advanced process monitoring and control capabilities. Process data and key parameters such as thickness value, dispense rate, and total process time are stored and can be remotely monitored and accessed. This tool also provides a graphic user interface, which makes operation easy and convenient. VERTEQ 1600 is equipped with an integrated dispense head for precise delivery and level control. This asset can disperse any type of liquid photoresist material, ranging from thick to very thin viscosities. The dispense head is mobile and can be positioned to optimize coverage over the entire substrate area. This model is also equipped with an advanced vision equipment that accurately tracks and images the adjacent locations of the substrate when depositing the photoresist material. With its advanced vision system, 1600 can deliver precise photoresist deposition to any area of the substrate, resulting in highly repeatable patterns. This unit is designed for easy setup and operation. With its built-in safety protocols and self-test mode, it ensures consistent, reliable performance. The user-friendly graphical interface allows users to create up to 25 customized recipes to save time and money. Overall, VERTEQ 1600 is an advanced photoresist machine delivering reliable accuracy and throughput. It provides a range of features that enable users to optimize their microelectronic production process and achieve superior photoresist deposition. Users are guaranteed unbeatable performance, reliability, and excellent process control.