Used VERTEQ 1600 #9229807 for sale

VERTEQ 1600
Manufacturer
VERTEQ
Model
1600
ID: 9229807
Wafer Size: 6"
Spin Rinse Dryer (SRD), 6".
VERTEQ 1600 is a leader in the photoresist equipment market. It is a flexible and reliable photolithography system offering superior performance for both advanced and cost-effective production. It is designed to efficiently process a variety of substrates such as silicon wafers, aluminized glass, PCBs, flat panel displays, and OLEDs. The unit includes a resist processor, exposure machine, developer, and dryer. The resist processor allows for precise coating of the photoresist onto the wafer, ensuring reproducibility and control of the coating thickness. The uniform exposure tool produces high resolution patterns which enable fine feature size printing for advanced device structures. The programmable high-pressure spray developer ensures efficient and uniform development of the exposed photoresists. After development, the dryer module quickly and uniformly dries the now patterned wafers to prevent water-marking of the resist. 1600 offers a variety of advantages for production environments. Its advanced optical asset offers improved consistency in patterns from wafer to wafer. Additionally, its self-diagnostic programs identify any problems in a timely manner, minimizing the need for expensive repairs or interruptions in production. Finally, its optimized programming capabilities enable a highly automated workflow with minimal human intervention. VERTEQ 1600 is an ideal choice for production operations that require precise pattern generation with excellent repeatability. Its advanced features enable high quality and efficiency of production, making it a valuable investment for all photoresist model users. It is a reliable and cost-effective option for any photoresist equipment user.
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