Used VERTEQ 1600 #9245627 for sale

Manufacturer
VERTEQ
Model
1600
ID: 9245627
Wafer Size: 4"
Spin Rinse Dryer (SRD), 4" Rated: Voltage: 1Ø, 2 W, 220 VAC Current: 50 A Frequency: 50~60 Hz Power consumption: 1.10 kW.
VERTEQ 1600 is a precision photoresist equipment that enables total control and accuracy in the lithography process. This system is the best choice for applications requiring high resolution, where difficulty in registration must be minimized. 1600 features a high-accuracy 6-axis articulating manipulation arm and a 5-axis rotation module, allowing for maximum flexibility in manipulating substrates. Additionally, VERTEQ 1600 features a patent-pending "top plate" which moves to meet the substrate, allowing the unit to quickly pick substrate without any contact. This delicate process combined with the precisely placed substrates and bottom plate allow for exact registration and control throughout the entire process. 1600 supports 4-inch and 6-inch diameters, thus providing high accuracy on standard as well as non-standard substrates. The machine also offers user-defined process control and high resolution imaging features, which are specifically configured for wafer level processes including photoresist spinner, exposure, developing and wet processing. The advanced optical design and wavelength accuracy provide precise imaging for the wafer alignment process and enable reliable operation. VERTEQ 1600 provides superior protection of the substrates from environmental dust or damage due to the vacuumed sealed capture tool. The asset's low profile design allows it to fit in spaces that may not typically allow for full suction cup based solutions. It is compliant with the latest safety protocols and is designed to minimize harmful emissions. 1600 model provides the highest levels of accuracy and repeatability in lithography, making it the optimal choice for applications requiring precise imaging. This photoresist equipment is designed specifically to handle the exacting demands of wafer level processes, such as photoresist spinner, exposure, developing and wet processing. The advanced optical design, superior protection, and enhanced reliability make this system one of the best on the market today. VERTEQ 1600 unit is the perfect choice for both research and development and production applications.
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