Used VERTEQ 1600 #9280736 for sale

VERTEQ 1600 is a photoresist equipment designed to enable the development of intricate, high precision photolithography patterns for electronic, optoelectronic, and other MEMS (micro-electro-mechanical) circuits. This system consists of a high-resolution camera, a light source, and a lithography tool. 1600's camera is capable of imaging up to 16 megapixels in 12 bits per color (3 channels) and is equipped with an internal illumination unit. The camera utilizes a dual-mask-alignment machine which utilizes a grid pattern to accurately align pattern frames with nominal accuracy of +/- 5 um. This precision allows for high detail, low-loss imaging which is ideal for MEMS and optoelectronic applications. The light source of VERTEQ 1600 is a 400 watt short arc lamp which provides a uniform, high-intensity illumination. The tool also incorporates a dual light filtering asset to allow flexibility in exposure times and spectral range. This allows the user to adjust illumination and exposure times based on specific requirements and application. The lithography tool of 1600 facilitates precise exposure of photomasks. It utilizes an integrated stepper motor and independent controllers to facilitate full, three-dimensional movements in all directions, allowing for high accuracy, repeatable features to be crafted at any angle with up to +/- 7.5 um positioning accuracy. The lithography tool also includes a focusing model to ensure the best possible fidelity of exposure. VERTEQ 1600 is an advanced photoresist equipment, designed to enable the development of intricate patterns for electronic and optoelectronic circuits. Its high resolution camera, dual mask alignment system and 400 watt short arc lamp, in addition to its integrated lithography tool, provide precision exposure enabling high detail, low-loss imaging ideal for MEMS and optoelectronic applications.