Used VERTEQ 1600 #9383555 for sale

Manufacturer
VERTEQ
Model
1600
ID: 9383555
Spin Rinse Dryer (SRD).
VERTEQ 1600 is an advanced photoresist equipment designed to provide reliable and efficient photolithographic patterning of substrates such as glass, wafers, samples, and more. It utilizes laser-based resist processing technology to achieve high precision pattern replication and uniformity in semiconductor processing. 1600 is the culmination of over two decades of cutting-edge research and development. It features a highly configurable platform that allows engineers to optimize their process through the precise control of a variety of parameters such as waveform, scanning speed, resolution, power, and pulse width. The system utilizes a patented dual beam writing unit with advanced photolithographic and computer control to enable seamless fabrication. This arrangement allows for high speed process rates and the highest precision available in the industry. VERTEQ 1600 is equipped with two high-speed micrometer-spaced, laser-driven scan heads and comes with advanced alignment stability and analysis capability. Its automated feature recognition machine (AFR) is designed to automate complex alignment algorithms, and can recognize any pattern and position accordingly. The photoresist material used by 1600 is a low-cost, water-soluble polymeric material, allowing for a clean and fast application and cleaning process. This enables high throughput and repeatability, as well as higher yields. The tool is also equipped with its own user interface, allowing for control by an operator or through the direct monitor of the machine. With VERTEQ 1600, operators have the ability to monitor and adjust process parameters in real time, providing seamless and consistent process control. 1600 is an excellent choice for fabricating small batches of average-size substrates or precision processing of high-value substrates. Its robust design and fast throughput make it a cost effective and reliable solution that can be easily integrated into existing processes.
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