Used VERTEQ 1800-50 #9383157 for sale

VERTEQ 1800-50
Manufacturer
VERTEQ
Model
1800-50
ID: 9383157
Wafer Size: 8"
Vintage: 1995
Spin Rinse Dryer (SRD), 8" Process: Cobalt 1995 vintage.
VERTEQ 1800-50 photoresist equipment is a powerful and advanced solution for photoresist lithographic operations. It utilizes state-of-the-art technology to enable the highest level of precision for positive photoresist processing. The system uses advanced optics to provide maximum accuracy and performance for device repair/replacement and other sensitive photoresist processes. The unit includes a wafer handling station that can move up to 50 wafers at once. It is also equipped with an integrated image-aligner and a maskless lithography head. The image-aligner provides an accurate and automated transfer of the lithographic pattern from a design layout to the wafer. The lithography head has a camera that is used to monitor the writing process and verify proper alignment of the photoresist. It is also the source of the light used to image the photoresist. The machine has a high-precision automated wafer positioning, which is used to ensure the repeating accuracy of the patterns across multiple wafers. It also includes a photo-resist-coater that applies the correct level of solvent onto the wafer substrate and holds it in place during the patterning process. The high quality of the patterns is further ensured by the tool's automatic controls for exposure time, alignment, and doping. In addition to the automated components of the asset, 1800-50 also features a manual alignment process, which allows corrections to be quickly and accurately made to the patterning of the substrates. The model also includes a sophisticated alarm equipment that helps to detect any errors or malfunction in the patterning process. Finally, the system is equipped with a diagnostic and analysis package, which allows for a detailed assessment of the wafer and its patterning. This analysis package contains an advanced pattern analysis engine to determine the quality of the patterns, and can detect any anomalies in the data produced.
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