Used VERTEQ 1800-50 #9383159 for sale

VERTEQ 1800-50 photoresist equipment is a versatile and highly reliable platform for pattern transfer and wafer production. It is ideal for the production of a variety of components, including semiconductor devices, displays, and dense component packages. The system is outfitted with a number of features and components designed to maximize efficiency and precision in the photolithography process. It includes a fully automated, high-speed conveyor unit, with a loading platform and a unloading platform. The unloading platform utilizes a vacuum-assisted mechanism to provide a gentle, uniform loading and unloading action. The machine also features a top-loading mask cassette tray to ensure fast and easy mask changeover. In addition, it is equipped with an automatic tracking machine, providing accurate alignment of the masks to the wafers for highly precise alignment. The tool's process chamber is equipped with bright LED lighting for excellent illumination, as well as a powerful step and repeat alignment asset for exceptionally precise positioning of the masks. A sophisticated pattern recognition model allows operators to quickly identify patterns and accurately transfer them to the wafer surface. In addition, the equipment can be customized to meet specific production requirements. It is equipped with software that allows for timed exposure and programmable processing, as well as advanced programmable recipe pool that supports automation and high-speed manufacturing. It is also capable of automatically controlling and managing all of the processes involved in the mask aligning and exposure process and provides a comprehensive suite of diagnostic toolset for detecting and managing errors in the mask alignment and exposure process. The system is built on a modular design that allows it to quickly adapt to changing manufacturing requirements. The unit utilizes state-of-the-art safety features to simulate the conditions used in the patterning process and for providing effective air purification and temperature control. Furthermore, the high-efficiency air scrubber and dust catcher help ensure a clean environment, allowing for consistent exposure readings. Overall, 1800-50 photoresist machine is an excellent choice for semiconductor manufacturers looking for a versatile, reliable, and cost-effective solution. It is capable of meeting the most stringent requirements for precision pattern transfer, while providing an efficient and highly reliable platform for wafer production.