Used VERTEQ 1800-6 #80289 for sale

VERTEQ 1800-6
Manufacturer
VERTEQ
Model
1800-6
ID: 80289
Wafer Size: 8"
Double stack SRD, re-manufactured, 8" Non contact labyrinth rear bowl seal (New) Micro Processor controlled programmable controller RA10 Finished bowl (New or Hand polished back to original surface) 8” Rotors for low or high profile cassette (New) Door/window with treated surface (New) Hub (new or polished back to original surface) Door Seal (New) Spray Nozzles (New) DI/N2 Valves (New) EPO Static Eliminator (New PFA rings) Refurbished Motors Resistivity Guaranteed Particle counts < 20 at .15 micron 17 meg Ohm DI water and class 1 N2.
VERTEQ 1800-6 is a compact, high-performance photoresist equipment that is ideal for industrial use. This system is designed for the development, etching, cleaning, and stripping of circuitry on printed circuit boards and wafers. The unit is capable of automated repetition and can handle different substrate materials with great precision and accuracy. 1800-6 features a high-resolution MegaVis imaging machine which is capable of producing highly accurate images of the material being processed. This tool also features an advanced multi-segmented solution delivery asset which can be programmed to apply the correct amount of photoresist to an area without overlap or excessive application. The model also features a programmable, multi-stage override automation equipment which can be configured to provide pre-programmed dwell time before insertion and extraction of the product. This helps in allowing the user controlled and repeatable solutions. The system uses a 12-inch cylinder head to ensure uniform contact between the substrate and photoresistor plate. The photoresistor plate is set in a vacuum chamber for thermal isolation and for maintaining the desired level of pressure. There is also an adjustable cooling unit to minimize contamination of the processed area. The machine has an advanced surface detection tool which can be used to detect areas of interest and avoiding contact and contamination. The photoresistor plate can be moved around inside the chamber to provide a clear view of the desired area, and the plate itself can be adjusted for fluctuating temperatures and to reduce the thermal shock between the substrate and the plate. VERTEQ 1800-6 provides a precise, reliable, and user friendly experience for the application of photoresist to substrate and wafer materials. It is designed for use in a professional setting and is capable of handling high volumes with great speed and accuracy. This asset is highly recommended for any industrial applications that demand precise results with minimal wastage of resources.
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