Used VERTEQ 1800-6 #9070696 for sale
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ID: 9070696
Spin Rinse Dryers (SRD), 8"
(1) Single chamber
(4) Double chambers
Connections: CDA/N2, DI In, N2 In, DI Out
Currently warehoused
2000 vintage.
VERTEQ 1800-6 is a state-of-the-art photoresist equipment designed to speed up and automate the photolithography process used in the fabrication of electronic devices. It is designed to solve even the most challenging resist contouring requirements. Using a high-performance projection system with 135nm resolution, 1800-6 is capable of producing high-fidelity images with extreme precision. Its highly advanced wafer processing cycle minimizes defects and increases wafer yield. VERTEQ 1800-6 features a chamberless front-end, which eliminates the need for multiple wafer-handling components that can reduce the quality of each process step. This unit ensures a fast, accurate and repeatable configuration that produces superior results. It incorporates a series of specially designed optical components for a high resolution, shadowless imaging machine, and features a compact, high-speed set-up/hold/clean wafer environment. 1800-6 also features a reliable direct exposure option that eliminates the need for large-scale processing tanks and developer cleaning. The tool is crafted from quality materials and is designed to operate in a wide range of environmental conditions. It also features a powerful control asset that automatically calibrates each parameter, allowing operators to quickly set up and fine-tune the device. In addition to its accuracy and flexibility, VERTEQ 1800-6 is designed to be user friendly and intuitive to use. Its user-friendly GUI interface grants access to in-depth performance optimization while also keeping installation and maintenance straightforward. The model also supports a vast range of both 180nm and below photoresists, allowing users to quickly adapt to any materials or production requirement. 1800-6 is an ideal solution to a wide range of photolithography applications. It provides a reliable platform for extreme precision and easy operation that can significantly reduce time-to-market and increase process efficiency, making it a well-rounded equipment for any photolithography application.
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