Used VERTEQ 1800-6AL #9089401 for sale
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ID: 9089401
Wafer Size: 8"
Dual Spin Rinse Dryer, (SRD), 8"
Bowl heaters
Static eliminators
Automatic door with front push button control
Front removable cabinet
A192-80M Rotors, 8".
VERTEQ 1800-6AL is a professional photoresist equipment designed to produce high resolution images with a wide range of features. This system uses patented maskless lithography to coat and develop photoresist onto a substrate, and it is capable of producing patterns with sizes as small as 1 micron in a single exposure. The unit is ideal for creating high precision micro parts and patterns for both analog and digital electronic components. 1800-6AL features an integrated baking station to simultaneously heat and shape the substrate. This allows for superior accuracy when coating photoresist compared to manual or air-drying. Additionally, its built-in software includes graphic wizards to assist in controlling exposures and offers users a programmable pattern library for rapid prototyping. This machine is also equipped with advanced real-time imaging software, providing a live view of the photoresist being applied. The tool's variable diffusion asset and stage size adjustment enable users to produce large and small features with ease. Its high-resolution camera model enables users to create intricate designs with micron level accuracy. Additionally, the equipment includes multiple optics configurations and an adjustable laser power for creating targeted, high resolution images. Additionally, VERTEQ 1800-6AL is fitted with a high vacuum deposition system for superior particle control for high resolution applications. Overall, 1800-6AL provides users with a powerful and reliable tool for creating intricate micro component designs. With its advanced features and high resolution imaging, this unit is well suited for both prototyping and mass production of electronic components. It is capable of accepting a wide variety of substrates and materials, making it a versatile choice for designers who need precise patterns in a short amount of time.
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