Used VERTEQ 1800-6AL #9101489 for sale
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ID: 9101489
Wafer Size: 8"
Vintage: 2003
Dual stack systems, 8"
(2) Rotors- A198-80MB
Rear p/s controller (bottom)
Start control panel
Foot switch
2003 vintage.
VERTEQ 1800-6AL is a high performance photoresist equipment designed for a variety of photolithography applications. The system features advanced design features including high resolution mask alignment, advanced 14-bit automated exposure control and Scanning Mask Descrambling as well as experimental real-time Automatic Exposure Adjustment capabilities. The unit is equipped with dual-stage low-temperature imaging, which ensures accurate pattern imaging with low thermal shock to the sample. It is also equipped with a sample stage that can handle a variety of sample types, including wafer, mask, and plastic substrates. 1800-6AL is a digital machine for use with both digital imagers (DIA) and photoresist films. Its low-temperature imaging tool provides the best imaging performance with high resolution for a variety of digital masking applications. Its advanced 14-bit automated control make exposure adjustment and pattern control easy and accurate, allowing precise pattern imaging with minimal distortion. The asset is also designed to provide reliable and repeatable imaging results with a wide range of exposures and temperatures. Additionally, the model is capable of adjusting real-time exposure in order to improve imaging accuracy. The equipment is designed for maximum operator safety with safety interlocks and an adjustable safety chute. The LED-illuminated safety barrier determines the height of the exposed sample when the operator passes through the chute. Additionally, the system features a range of sensors and alarms to detect and control potential safety hazards when using photolithography. The unit allows for precise mask alignment with the use of advanced optical measuring devices. Mask alignment is essential in photolithography as it ensures accurate pattern replication from the original to the sample. The machine can also provide precise control of the exposure level, scan speed, and exposure time. This advance control allows for improved pattern accuracy and high throughput. VERTEQ 1800-6AL is an advanced photoresist tool designed for a variety of lithography applications. Its advanced design features ensure accurate pattern imaging with minimal distortion and a wide range of exposures and temperatures. Its advanced 14-bit automated control allowing exposure adjustment and pattern control, auto exposure adjustment and precise masking alignment functions, adjustable safety chute, and intelligent safety interlocks make the asset the ideal choice for a variety of digital masking applications.
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