Used VERTEQ 1800-6AL #9255507 for sale

VERTEQ 1800-6AL photoresist equipment is an integrated resist deposition and post-exposure bake (PEB) system designed for photolithography applications. This unit features high-performance resist delivery, as well as an advanced post-exposure bake station, providing dedicated temperatures and time settings for optimized process repeatability. 1800-6AL is designed with a vertical configuration which greatly reduces footprint and simplifies maintenance. The machine features a high-precision, corrosion-resistant, resist delivery pump and vacuum venturi to ensure smooth resist deposition and consistent resist thickness. An intuitive user interface provides an easy-to-use tool with up to twelve separate recipes, allowing users to quickly configure their desired resist environments. Furthermore, the asset is equipped with hot plates and controls adjustable in temperature or time range. The post-exposure bake station is constructed of aluminum for thermal stability and enhanced uniformity. It is also equipped with a high capacity heated resist dish that helps maintain a consistent resist temperature throughout the exposure. VERTEQ 1800-6AL model is well-suited for a variety of photolithography applications and is designed with both process and operator safety in mind. A key feature of the equipment is the "fail-safe" capability in the event of multiple process malfunctions. This feature ensures that no additional damage can be caused to the system in these potentially hazardous situations. The unit is also designed to be entirely maintenance-free, allowing users to recognize an extended service life and minimal maintenance costs. In conclusion, 1800-6AL photoresist machine is an ideal choice for applications requiring repeatable high-precision resist delivery and uniform post-exposure bake temperatures. It is designed with both process and operator safety in mind and features intuitive user interface and fail-safe capabilities, making this tool the perfect choice for advanced lithography processes.