Used VERTEQ 1800 #293760299 for sale

VERTEQ 1800 is a photoresist equipment that offers yield-throughput improvement by up to 25% compared to other optical projection systems. It is a versatile single-exposure tool that is suitable for a range of fine-line lithography processes, including single and double patterning. The system offers a wide magnification range of 5x-80x with high resolution and stability. 1800 series of photoresist systems feature a high-power and high-resolution binary projection optic that delivers extremely efficient 0.165 micron feature size capability. The exposure is enabled by up to nine laser diode light sources that provide an maximum of 16 megawatts of UV power to increase throughput. The photoresist unit is also capable of BCD, die-to-die and wafer-to-wafer alignment techniques. VERTEQ 1800's automated modules come with advanced alignment features and pattern based optimization for improved process repeatability and accuracy. The machine provides an automated Multi-User Interface (MUI) which can be employed for multiple operations and enhanced throughput. In addition, the software supports Reverse Tone Exposure (RTE) for precise analog curve distributions. 1800 also features on-wafer voltage trimming to swiftly adjust excess voltage across a wafer with minimal downtime. In addition, the tool is designed with several intelligent sensor slots to monitor the temperature, power, dose and wafer-to-wafer alignment. This vigilant monitoring of the environment guarantees planarization of wafers with faster droplet settling and minimal contamination. The asset is also equipped with a precise geometrical overlay capability in which the micro-module can detect the pattern and align them in the exact position even when the majority of the area is distorted. Furthermore, the inbuilt MEMS scanner technology in the photoresist model ensures no looping-delay time and its wide scanning speed of up to 400 millimetres per second ensures uniform feature coverager. Overall, VERTEQ 1800 photoresist equipment provides features such as optimized stability, yield-throughput improvements, automated MUI and high resolution as compared to traditional systems. This makes the photoresist system the ideal choice for producing fine line lithography applications.