Used VERTEQ 1800 #9410983 for sale

Manufacturer
VERTEQ
Model
1800
ID: 9410983
Wafer Size: 6"
Spin Rinse Dryer (SRD), 6".
VERTEQ 1800 is a state-of-the-art photoresist equipment designed for intricate microelectronic fabrication processes such as PCB production, MEMS, and advanced packaging. The advanced system provides superior photoresist resolution and high exposure accuracy, making it well-suited for a wide variety of potential applications. 1800 utilizes a high-end mercury exposure source that enables exposure at 18 J/cm²/sec, which yields production-grade features of 0.1-0.2μm in minimum width with an accuracy of plus/minus 5%. The unit's mask-based exposure technique provides users with the capability to apply different exposure doses for different parts of the pattern. This allows for extremely high resolution fabrication in areas such as MEMS. VERTEQ 1800 is designed with an advanced, high sensitivity optical machine. It also uses a 100-ms flash lamp, as well as direct imaging technology, to detect light scattered from resist patterns. The entire tool includes an advanced resist handling station that enables repeatable and comprehensive management of microelectronic resist materials. 1800 is a completely integrated asset that allows users to enjoy optimal throughput and low operability costs. It uses a fully automatic resist loading and unloading mechanism and an optimized process flow, enabling users to quickly perform processes such as photoresist coating, exposure and development. Overall, VERTEQ 1800 is a high capacity, reliable and efficient photoresist model that offers users the advantage of production-grade features with high accuracy. Its advanced features make it a viable option for a variety of microelectronic fabrication needs and offer users a cost-effective solution for photoresist production.
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