Used VERTEQ 2600 #9144776 for sale

VERTEQ 2600 is a next-generation photoresist equipment from VERTEQ Technologies. Using advanced imaging technique, the system is able to produce high-precision or high-volume photoresist patterns with exact form, shape or location no matter the substrate. It is capable of producing extremely high-definition photoresist patterns with micro-sized feature sizes and accuracy. 2600 photoresist unit utilizes a laser-based imaging machine that is precision-guided by an optical digital microscope. The laser beam is directed sector-by-sector to the photomask, selectively exposing certain areas of the photomask and creating a pattern in the photoresist. The photoresist is then subjected to a developer process to remove the exposed regions, which can be used as a foundation for the development of further device features. VERTEQ 2600 can be used to create precise patterns on extremely thin photoresist layers, such as those required for microelectronics and MEMS application. 2600 tool also uses highly advanced imaging software to create photomasks from complex user-defined designs. The software is capable of automatically recognizing the features of a design and generating the corresponding pattern required for the photomask with extreme resolution and accuracy. The photomask is then transferred to the photoresist-casting substrate, which is placed on VERTEQ focusing stage, with the laser asset then used to image the photomask layer-by-layer. By using VERTEQ 2600, users are able to benefit from highly precise images and greater process control for photoresist patterns. 2600 photoresist model is ideal for photomasking, pattern transfer, photolithography, planarizing, and other advanced electronics applications. Its comprehensive feature set and advanced imaging capabilities make it the perfect choice for manufacturers looking for precision photoresist patterning solutions. The equipment is reliable, easy to use and cost efficient, making it a great choice for any application that requires precise photoresist patterns in high volumes.