Used VERTEQ MEGASONIC #9187710 for sale

VERTEQ MEGASONIC is a photoresist equipment designed for PCB and microelectronic applications. It uses a specialized membrane technology to attach a thin layer of photoresist to almost any substrate. This photoresist is then exposed to light through a mask or directly, which causes it to harden in certain places when exposed to the light. This hardening of the photoresist enables these desired areas of exposure to be etched away, while the unexposed areas remain intact. MEGASONIC photoresist system is highly resistant to water, acid, and other chemicals, and is designed to stand up to extreme temperatures as well. This makes it ideal for use in high temperature processing and other challenging applications where it is necessary to remove material from uniquely shaped components with precision. With the MEMS technology used in the unit, it is possible to deliver focus spots as small as submicrons. VERTEQ MEGASONIC machine also allows for different types of photomasks to be used, allowing for precise and repeatable transfer of designs into the photoresist. This makes the tool suitable for production applications, where tight tolerances and repeatability are desired. The asset is composed of several components. At the highest level, they consist of a light source, photomasks, the photoresist drum, pre-cleaning processes, photomasks masking station, imaging equipment, post-cleaning processes, and substrate material. The light source of the model drives the equipment and is typically a UV, infrared, or electron beam, depending on the application. It is also important to have the right power, intensity, and spot size for the desired job. Photomasks are used to direct the light into the photoresist and allow for precise imaging. They typically consist of a series of patterns on a transparency to direct the light to the desired areas. The photoresist drum is a device on which the cameras are placed to enable imaging. The drum is rotating at high speeds, allowing for exposure times of less than a second. Pre-cleaning processes remove any particles or contaminants from the photoresist surface before it is exposed. This ensures that no particles or impurities are left to affect the quality of the image. The imaging station is used to direct the photomask and the substrate into the imaging path. The imaging station is typically equipped with inspection cameras to ensure a quality exposure or clean substrate before the photoresist is applied. The Post-cleaning processes are used to remove any residue from the process which may remain on thephotoresist surface after exposure. This is necessary to ensure that the photoresist layer is completely free of defects. The material used for the substrate is as important as any other component of the system as it needs to be able to withstand temperatures during the exposure process. Depending on the application, different materials such as polymers, composites, or metals may be suitable. In conclusion, MEGASONIC photoresist unit is ideal for high-precision applications in industries where tight tolerances and repeatability is needed. With its specialized membrane technology and resistant material, VERTEQ MEGASONIC machine is a reliable choice for many PCB and microelectronic applications.