Used VERTEQ ST600-41L #293597566 for sale

Manufacturer
VERTEQ
Model
ST600-41L
ID: 293597566
Vintage: 1994
Megasonic cleaner 1994 vintage.
VERTEQ ST600-41L photoresist equipment is an advanced system designed to process photoresist mask materials and offer reliable results. This unit is made up of advanced lithography, metrology, and track tools, and features a vacuum photoaligner designed to reduce defects and improve yields. ST600-41L Photoresist Machine is an advanced tool with the following features: Multi-Layer Photoresist Processing: VERTEQ ST600-41L asset is able to process up to four photoresist layers simultaneously. This means that complex structures and features can be easily produced. Additionally, the model can process both thick and thin films, reducing the need for additional thin film processes. Sub-Micron Resolution: The equipment boasts an industry-leading resolution of 0.2 microns, ensuring the highest level of precision during photoresist processing. Multi-layered structures with widths and heights of 0.2 microns can easily be processed with this system. Automated True Focus Metrology Unit: ST600-41L includes an automated true-focus metrology machine, which enables users to accurately measure the optical focus of patterns over a wide area. This improves line widths and uniformity. In-Plane Stage Control: The highly accurate in-plane stage control ensures a consistent pattern repeat accuracy (CD uniformity) over a wide area. This reduces the need for manual retouching. Integrated Ozone and UV Exposure Tool: The integrated Ozone and UV exposure asset ensures optimal consistency when exposing photoresist layers. High-Precision GY Axis: The high-precision GY axis offers precise positioning, making it easy to process wafer-level features. This axis can be accurately aligned using auto-shim requirements. Robot Loader: The robot loader allows users to quickly and accurately load and unload wafers in and out of the model. This reduces transfer errors and minimizes overall processing times. Process Tracking Software: The process tracking software enables users to consistently track the progress of a wafer's processing. This ensures that the final product will meet customer requirements. VERTEQ ST600-41L Photoresist Equipment is an advanced system with powerful features that enable reliable production of photoresist masks with improved yields. Its multi-layer processing capabilities, sub-micron resolution, and automated true focus metrology unit enable production of complex patterns and features with high precision. Additionally, its integrated ozone and UV exposure machine, high-precision GY axis, robot loader, and process tracking software help to reduce process times and errors.
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