Used VERTEQ ST600 #9096618 for sale

Manufacturer
VERTEQ
Model
ST600
ID: 9096618
Vintage: 1994
Megasonic tank and control system, 1994 vintage.
VERTEQ ST600 is a photoresist equipment designed for precise laser beam exposure of photosensitive resins on wafers used in the microelectronics industry. It is based on the stepper principle and features a field size of up to 6- inches and a stepper movement speed of up to 600 mm/s. The system also features an integrated power supply with adjustable power levels and pulse lengths to allow for precise control over the exposure process. The unit is comprised of multiple components, including a stepper with an integrated laser source, an object table, and a wafer holder. The stepper and laser source are compatible with standard laser sources, such as HeNe, CO2 and Ar designs. The stepper works to create ultra-fine images on the wafer surface, with a minimum feature size of 0.3 μm. The object table is used to hold the wafer in place during exposure, while the wafer holder functions to secure the wafer in place. The machine also features integrated imaging and control software, which allows operators to program, adjust and observe the stepper and laser source settings. This software allows the user to create images easily, adjust the exposure and the laser point size, and program exposure parameters. Additionally, it allows the operator to optimize process parameters to create desired patterns on the wafer. VERTEQ ST 600 also has an integrated vacuum tool, which ensures accurate imaging. It is designed to keep the wafer flat and in place during the exposure process, providing a precise and consistent pattern on the wafer. The wafer is also automatically aligned to the center of the stepper detector, eliminating any potential misalignment during operation. Overall, ST600 is a highly advanced and reliable photoresist asset for exposure of photosensitive resins on wafers. It offers a field size of up to 6-inches and a stepper movement speed of up to 600 mm/s, making it suitable for high-speed operations and precise laser beam exposure. The model also features integrated imaging and control software, as well as an integrated vacuum equipment, allowing for reliable and accurate exposure results.
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