Used VERTEQ ST800-41L #9157379 for sale
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VERTEQ ST800-41L is a high-performance, low-cost photoresist equipment designed specifically for microelectronics manufacturing processes. The system utilizes a combination of advanced UV light, optics, and photochemical processes to create precision masks for patterning on the substrate's surface. This type of photoresist unit consists of a source of ultraviolet light, optics which focus the light onto the substrate surface, and a method for chemical interaction between the UV light and substrate material. The ST800-41 L's advanced UV light comes from one of the highest reliability, robust, and long-life SCR ManLab arc lamps available. This light is optically concentrated through an advanced optical focusing machine that is designed specifically for the UV lithography process. This focusing tool guarantees that the exposure field size will be accurate and consistent, creating precise patterns on the substrate surface. ST800-41L also comes with an integrated PLC controller for easy operation. Through the controller, users can accurately monitor the light intensity levels during the exposure process, as well as maintain the correct exposure period. Furthermore, the asset is equipped with safety features for the prevention of accidents and unforeseen incidents. The photoresist model also offers an adjustable auto-mask deposition function, allowing users to control the amount of resist applied to the substrate. Auto-mask deposition is important for ensuring the resist coat is uniform across the application area and can even be used to make multiple masks in the same process. VERTEQ ST800-41L is an advanced, cost-effective solution for microelectronics manufacturing processes. The components combined in the equipment allow for precision lithography with precise and accurate patterning, and the integrated PLC controller allows for quick and easy operation. Furthermore, the adjustable auto-mask deposition system allows users to accurately control the resist application process for precise and uniform results.
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