Used VERTEQ SuperClean 1800 #9254916 for sale

VERTEQ SuperClean 1800 is an advanced Photoresist Equipment designed to quickly and effectively remove the surface residue of a variety of materials from substrates such as silicon wafers, MEMS, and other sensitive devices. The powerful Ozone/Plasma system emits a stream of plasma to quickly clean and process the residues from various materials. This innovative unit has the ability to deliver finely tuned plasma chemistries in a variety of formats including convective heating, controlling both the energy density and the thermophysical characteristics of the material being processed. Additionally, SuperClean 1800 has adjustable power settings for optimal results. VERTEQ SuperClean 1800 features a patented evacuation chamber that releases ozone into a vacuum environment for enhanced cleaning. This ensures quick and complete removal of all photoresist residues and other foreign materials. The Ozone source and evacuation chamber are separated by an ionization path to help eliminate the presence of any unwanted particles. This is especially beneficial when working with small or delicate parts. SuperClean 1800 also features a patented cooling machine to maintain temperatures below 50 ̊C during operation, ensuring the safety of the sensitive parts being processed. This tool is designed for straightforward operation with intuitive software and an intuitive user interface. Necessary process parameters can be inputted into the asset while a learn cycle mode allows the user to simulate process parameters before applying them. This model also enables automated control with a removable wireless thumb drive. Additional features such as temperature and humidity monitoring further increase the equipment's safety and accuracy. VERTEQ SuperClean 1800 is CE & RohS certified to demonstrate compliance with international safety standards, making it a reliable and cost effective solution for Photoresist cleaning. This system is a great choice for production-level fabrication processes that must manage the removal of photoresist residues and other contaminates from substrates. SuperClean 1800 provides effective cleaning of surfaces quickly and efficiently while maintaining a safe environment for the delicate substrates.