Used VERTEQ SuperClean 1800 #9266842 for sale

VERTEQ SuperClean 1800 is an advanced photoresist equipment for wet-chemical processing of semiconductor wafers. This automated system is capable of performing both cleaning and etching processes with the highest levels of precision and accuracy. SuperClean 1800 utilizes a patented, three-stage cleaning and etching process to ensure superior removal of all contaminants, residue and other particles, while maintaining precise control over the thickness of the final layer. VERTEQ SuperClean 1800 is an industrially-certified unit, providing superior wafer cleanliness over traditional laboratory methods. The machine uses a specialized solution to clean the wafer, while at the same time etching away any particles or residue. The cleaning solution is designed to quickly break down any residues while the etching process removes any remaining particles. This process is then repeated twice, each time increasing the depth of the etching while ensuring the highest levels of cleanliness and precision. SuperClean 1800 tool is also designed to handle various types of photoresist, including SU-8, AZ P4620 and 1614 DUV. The asset features a unique automated process which is capable of handling up to 400 different photoresists without the need for manual labor. This ensures that the photoresists are properly cleaned and etched with the utmost precision and accuracy, while also eliminating any potential contamination or errors in the wet-chemical process. In addition, VERTEQ SuperClean 1800 model is also capable of providing tight particle control with a unique particle validation function. This feature allows users to regularly check the cleanliness of their wafers and ensure that they are free of any particles or residue. By using this automated equipment, users can rest assured that their wafers are clean and of the highest quality. Overall, SuperClean 1800 is an advanced photoresist system that provides superior speed, accuracy and quality for high-precision wet-chemical processing. With its automated process, detailed particle validation feature, and excellent compatibility with various photoresist materials, users can trust in reliable, consistent results.