Used VPT Argus 58 #9199501 for sale

VPT Argus 58 is a photoresist equipment designed for wafer fabrication and microlithography applications. The system is capable of producing high-definition images with a resolution of up to five times that of conventional tools, while offering high repeatability and ultra-low UV exposure time. The unit is capable of operating at low resist pressure and low UV exposure levels, enabling accurate patterning of micro- and nanoscale features. The machine utilizes a helium-neon laser to induce photosensitive molecules to deposit onto the wafer in controlled patterns. This yields highly accurate and consistent patterns, which is critical for microlithography applications. The tool is well suited for a variety of tasks such as photolithography, laser patterning, and resist coating. The asset includes a 12-inch stepper/scanner for wafer alignment and precise resist deposition. It is also equipped with a computer-controlled laser beam spot size model for precise beam control, and a software-based beam scanning equipment to scan the resist across the wafer surface. This allows for submicron-level resolution on resist deposition. Argus 58 also includes optional features such as a helium-neon super-resolution quadrant feature, which enables patterns to be spliced together with a gap of less than 10µm; an automatic optical centering system that precisely aligns the wafer; a cross-wafer synchronization feature for better registration of photosensitive layers; and an Opticlock unit for precise patterning. Overall, VPT Argus 58 is a reliable tool for high-definition microlithography processes. Its features enable precise and accurate patterning, resulting in higher yielding wafers and increased productivity. The machine is simple to use and compatible with a large number of photoresist materials. Argus 58 is an invaluable tool for any semiconductor facility and is a must-have for producing the most advanced integrated circuit devices.