Used WEIMENG 200 #9396582 for sale

WEIMENG 200 is a photoresist equipment designed for performing lithographic processes. It is a high performance, third-generation photoresist system that has been uniquely designed for the needs of high-end research, manufacturing and process development. 200 is capable of forming patterns using various photoresists with various levels of resolution. The unit is particularly suitable for production of fine line and high-topology features. It is a multi-layer machine with a variety of features that can be easily customized to meet specific requirements. WEIMENG 200 utilizes a chemical release agent, which is used to prevent the resist from sticking to the substrate during subsequent processes. To control the alignment of the photoresist patterns, the tool employs an auto-alignment mechanism. This mechanism uses a low-power laser to measure the exact position of the substrate, and then it moves the mask accordingly. For the illumination, 200 is equipped with spectral control filter technology. This feature allows the user to adjust the color, intensity and exact wavelength of the light to suit the process requirements. The asset also has integrated in situ processing capabilities, which enables the user to run multiple tools at the same time. The model has several exposure conditions including conventional contact, proximity, and immersion exposure systems. The equipment is also capable of high-aspect ratio (HAR) exposure, which allows the user to fabricate highly precise patterns and features with a wide range of resistivity. Overall, WEIMENG 200 offers exceptional reliability, accuracy, and cost efficiency. Its features make it an ideal choice for high-end applications in the fields of semiconductor fabrication, microelectronics, biotechnology, and many more.