Used WERNER MATHIS LFT #9069946 for sale

WERNER MATHIS LFT is a type of photoresist system used in microelectronic device manufacturing. It is based on a sandwich structure consisting of two layers: a negative photoresist layer of benzotriazole polymers and an acid-sensitized layer of LFT (aka Latent Functional Thickness). This combination acts as a gatekeeper between the underlying photoresist layer and the surface of the wafer. When exposed to UV light, the acid-sensitized WERNER MATHIS LFT layer reacts, forming a viscous film that acts as a mask for the photoresist below. When UV light is applied to the wafer through the photomask, selectively reactive areas of the photoresist layer can be exposed or covered depending on the intensity of the light. The position of the photomask is then adjusted to properly pattern each device layer on the wafer. Once subjected to a development and baking process, the polymer photoresist forms a thin layer on the surface of the wafer that is analogous to the pattern first formed on the light sensitive layer. Once the photoresist is exposed and cured, a thin layer of acid-sensitized LFT remains behind. This acts as a protective "gate" between the photoresist and the surface of the wafer. This absolute negligence to the underlying layers ensures precise patterning of the device elements. As a result, this photoresist system has found use in a wide variety of industries, particularly in areas related to semiconductor device manufacturing. In comparison to other photoresist systems, WERNER MATHIS LFT systems provide superior resolution and robustness. The use of specific combinations of LFT and polymers also enables good adhesion between the photoresist and the substrate. Furthermore, due to the relative speed of the development process, WERNER MATHIS LFT photoresist systems are able to accurately pattern high-volume batches of wafers in a short amount of time. Overall, LFT photoresist systems are an ideal solution for a wide range of electronic device manufacturing applications. The combination of acid-sensitized WERNER MATHIS LFT and technically-advanced polymers offers excellent resolution, good adhesion, and a rapid development process - all of which make it an ideal photoresist system for a range of industries dealing with microelectronic device fabrication.