Used YSYSTEM Ywafer mapper GS2 #293627974 for sale

YSYSTEM Ywafer mapper GS2 is a photoresist equipment designed by YSYSTEM. It is designed for the precision alignment and exposure of thin-film photoresist patterns onto large area substrates. Ywafer mapper GS2 is a micro-controlled evaluation system with advanced capabilities, offering high stability and unparalleled performance. YSYSTEM Ywafer mapper GS2 is a state-of-the-art photolithography unit that enables the production of high quality photoresist patterns with high precision and accuracy. It features an advanced alignment method with a laser diode positioning machine that allows for precise alignment on substrates of any size. The tool comes with a wafer frame that is capable of holding up to four wafers of up to 200mm in size. The static table ensures stable and low-vibration exposure of photoresists onto the substrates. The optical assembly of Ywafer mapper GS2 consists of a high-resolution imaging lens and a shutter asset. The shutter model enables the exposure of the photoresist pattern onto the wafer with a rapid exposure time of ≤1ms. The exposure time is highly adjustable and allows for exposure to a wide range of intensity levels. YSYSTEM Ywafer mapper GS2 uses a completely enclosed computer-controlled exposure chamber with a 4-zone heating equipment for controlling the exposure environment. The advanced temperature control system uses thermocouples to ensure a homogenous exposure environment and uniform exposure of the photoresists patterns across the entire area of the wafer. The integrated controller of the unit allows for easy operation and powerful imaging capabilities. The controller is equipped with a web-based data management machine for easy configuration of the tool settings and for processing of exposure data. Ywafer mapper GS2 is an efficient and reliable photolithography asset that provides the precision exposure of photoresists onto large area substrates with high resolution. The advanced control features such as the laser diode positioning model, shutter equipment and 4-zone heating system ensures uniform and high quality exposure of photoresists.