Used YUASA LPD-182 #293748586 for sale

YUASA LPD-182 is a high-quality photoresist equipment primarily used for wafer technologies such as microelectronics, biotechnologies, and photolithography. It is composed of three components: lithographic-grade photoresist, a resist strip solution, and a developer/dissolution solution. The resist strip solution is designed to remove surface contaminants, while the developer/dissolution solution removes the photoresist and unwanted byproducts. LPD-182 photoresist system is highly reliable due to its low-kV lithography method and its low temperature, high-quality wafers. The short wavelength of the photoresist unit enables it to create features that can be easily resolved and patterned onto substrates. This machine is especially effective at generating high-quality, small-scale features on the order of 1-5 microns in size, making it ideal for microelectronic applications. Additionally, because of its low temperature and low-kV lithography method, YUASA LPD-182 tool does not require litho-etch, saving time, energy, and cost. LPD-182 photoresist asset provides high throughput, cleanliness, uniformity, and improved photosensitivity. In addition, the model enables easier patterning on the substrate surface with its low-kV lithography method and allows for greater process flexibility. The resist strip solution facilitates even surface cleaning, removing organic surface contaminants on glass and silicon wafers. The wafer is then pre-baked to remove residual contaminants and to prepare the surface for patterning. Photoresist dispense is then done via a dispense machine. It begins with the dispense of a very small amount of a lithographic-grade photoresist onto the substrate. This is done by placing the dispense head in contact with the substrate and then rapidly moving it while maintaining constant contact. This dispense method minimizes the amount of photoresist coating the wafer and thus reduces pattern non-uniformity. The substrate is then exposed to a light source which triggers the cross-linking of the photoresist molecules. The collected photons cause an increase in energy of the photoresist molecules which weaken their bonds and allow them to cross-link. This cross-linking is also enhanced by an alternate spinning of the substrate. After being exposed, the substrate is then washed with the developer/dissolution solution. The developer/dissolution solution removes the photoresist, as well as any other unwanted byproducts. The stress relief step used in YUASA LPD-182 photoresist equipment also improves the adhesion between the substrate and the photoresist. Finally, post-bake is used to provide extra hardening of the photoresist. The baking temperature of LPD-182 system can be adjusted depending on the desired characteristics of the pattern. The vertical lines, sharp edges, and high yield obtained from YUASA LPD-182 unit make it a much sought after photoresist machine for microelectronic applications.