Used ZEISS A20 #9259775 for sale

ZEISS A20 Photoresist Equipment is a high performance, modular lithography machine used for nano-scale photolithography applications. It is ideal for the production of high-density electronic (HDI) circuits and memory chips as well as for advanced materials research. A20 is capable of imaging features size down to 12 nm with resolution, feature capture, and accuracy, making it one of the top photolithography system with the highest quality specifications. ZEISS A20 unit is equipped with advanced imaging optics and a micro-pattern generator for higher resolution images. The machine includes a direct exposure fine alignment (DFFA) tool and a vacuum exposure area capable of continuous imaging on 6" wafers and other substrates up to 15" in diameter. The automated control asset provides high repeatability and improved cycle times, with automated wafer loading and unloading. Additionally, the intuitive user interface makes the model easy to use for all users. This equipment is equipped with many features designed to increase the precision and accuracy of production, including a meta-stage for the fine alignment of the wafer on the substrate, an automated feature recognition system which helps minimize pattern distortion, and a high performance comparison microscope with an on-board metrology unit which displays feature position, orientation, size, and shape information with low noise levels. The machine is also capable of meta-stage scanning, which enables users to quickly inspect multiple locations for optimal imaging results. A20 tool has the flexibility to use a variety of resist formulations, as well as a wide range of process chemistry. It is also capable of running multiple process steps such as spin coating, soft baking, pre-imaging and post-imaging, all of which can be automated with state-of-the-art software systems. Additionally, the asset has a wide range of exposure sources, including argon fluoride, krypton fluoride, and YAG laser sources. Overall, ZEISS A20 Photoresist Model is an advanced photolithography equipment that provides users with the highest resolution images and accuracy for extremely precise micro-patterning. It has a wide range of features, including direct imaging and feature capture, automated resist coating, automated comparison microscopy, and on-board metrology. It is also capable of imaging features over 6" wafers and larger substrates and is designed for a variety of resist formulations and process chemistries, making it a powerful and versatile tool for a variety of advanced lithography experiments.