Used ZEISS B12 #9231341 for sale

ZEISS B12 is a photoresist equipment that is designed to provide the user with a reliable and efficient means of photolithography for the production of microfabrication components. ZEISS B-12 is based on the traditional 'spin-on' polymeric resists used in maskless photolithography, and it offers superior results in terms of resolution and pattern fidelity. The system is comprised of three main components: the photoresist, the delivery unit, and the vacuum chuck. The photoresist is a monomer that is tailored to a particular application. It is available in both positive and negative working formulas. The delivery machine is an automated maskless sprayer that dispenses the photoresist precisely and uniformly on the substrate. This allows for accurate patterning of the resist. The vacuum chuck holds the substrate in place during the photolithography process. B12 enables user-friendly and consistent photomasking accuracy, meaning the user does not need large amounts of time to properly mask their layers. The resist adheres quickly to the substrate to which it is applied, and no baking or hardening is required. B-12 interfaces seamlessly with other lithographic systems for ease of integration. The resolution that is obtainable with the tool is very high, allowing for features of down to 20nm in size to be reliably transferred on to the substrate. Further, both single and multi layer processes can be performed, allowing for high-throughput fabrication of complex layers in a timely manner. Due to its efficient and user-friendly methodology, ZEISS B12 is ideal for use in many different applications, such as semiconductor production, MEMS fabrication, and nanofabrication. The reliable high resolution, ease of integration, and versatile functionality, makes ZEISS B-12 a very attractive option for the production of microfabrication components.