Used ZEISS B12 #9245011 for sale

ZEISS B12 photoresist equipment is a cutting-edge solution for integrated photomasks and is designed for the rapid and cost-effective production of high-resolution patterns for lithography. The core of the system is ZEISS B-12 European-style Invesresit coater, which is capable of handling wafers up to 350mm in size. The coater utilizes closed-loop control of pressure, temperature, and coat speed to ensure precise and repeatable patterning results. The unit's integrated vacuum tool is used to achieve a low-stress environment during the pattern transfer process, resulting in improved adhesion and pattern fidelity. B12 photoresist machine also includes an advanced automation tool that increases throughput and enables multiple wafers to be processed simultaneously. The asset is equipped with a dual laser alignment model, which accurately positions the wafers on the coater. The robot-assisted loading and the automated cassette retrieval equipment further improves production efficiency. The wafers are then spin-coated and aligned with the correct photoresist using the integrated automated substrate exchange. The system features a user-friendly interface that simplifies the process from preset to completion. A recipe-driven graphic display provides real-time information on the process and allows users to quickly adjust parameters for improved performance. The unit also features integrated quality assurance protocols and supports data collection and process management to ensure repeatable high-quality outcomes every time. B-12 photoresist machine is designed to meet the demands of lithographic production and is ideal for use in semiconductor, photovoltaic, optoelectronic, and other disciplines that require the highest performance. The tool offers the advantages of speed, consistency, reliability, and cost-efficiency, all of which are required for the precision fabrication of photomasks.