Used ZEISS B12 #9245013 for sale

ZEISS B12 is a state-of-the-art photoresist equipment designed for nanofabrication applications. It is capable of fast, accurate, and reliable resist layer deposition and patterning. The system utilizes a combination of electron beam and laser technology to achieve sub-50 nanometer lithography resolution and highest achievable mask-less fabrication routines. ZEISS B-12 comprises of an electron beam column, a high-vacuum track, automated resist conformation and an integrated recipe unit. The electron beam, being an imaging source, is used to expose the resist layer and the high-vacuum track is used to move the substrate. The integrated recipe ensures that the desired energy, dose, and beam parameters can be pre-programmed to ensure repeatable results. Additionally, to ensure the highest resolution for patterning, the machine employs a powerful feedback control correction algorithm which corrects the focus and drift during the exposure process. B12 resists layers can be used for various applications such as nanocontainers, nanostructures, nanoparticles, and nanomaterials. Additionally, the tool can be operated in different modes for different applications such as batch, multi-level, multi-point, and high-throughput. The substrate stage of B-12 is also capable of handling arbitrary substrates such as wafers, glass slides, and vacuum compatible etched substrates. Furthermore, ZEISS B12 has a high sensitivity and can be operated over a wide range of dose levels, making it capable of printing very small features. This makes ZEISS B-12 ideal for applications such as quantum dots, high-density MEMs, sensors, and biomedical nanosystems. Additionally, the resist layer formed by B12 has proven to be very stable making it suitable for long term storage and re-use. In conclusion, B-12 is a powerful and reliable photoresist asset designed for high accuracy nanofabrication applications. It utilizes a combination of ion beam and laser technology to produce high resolution patterns and offers multiple substrates and exposure modes. The integrated recipe model ensures repeatable results and a powerful feedback control algorithm corrects focus and drift during the exposure process. Additionally, the resist layer formed by ZEISS B12 has proven to be very stable, making it ideal for long term storage and re-use.