Used AG ASSOCIATES 4100 #9146374 for sale
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ID: 9146374
Wafer Size: 3"-6"
Rapid thermal processors (RTP), 3"-6"
Includes:
Heating chamber: Two high intensity tungsten-halogen lamp arrays
System controller
Quartz isolation tube
Robot
Gas-control electronics
ULAP Filtration-system
Graphic user interface (GUI) computer system
Electronics
Mass-flow-controlled gas handling
Cooling
ULPA Filtration
Mechanical assemblies
Extended range pyrometer (ERP)
Recipe storage: 3-1/2" Floppy disk-drive
Options:
Non contact wafer aligner
Susceptor autoloader
E-SECS
Slip free
Dual-color pyrometer
Applications:
Silicon dielectric growth
Implant annealing
Glass re-flow
Silicide formation and annealing
Nitridation of metals
Contact alloying
Oxygen donor annihilation
Standard cassettes
Wafer handling: Automatic serial processing
Throughput: Process dependent
Ramp-up rate:
Programmable
Range: 1 – 180°C Per second
Steady-state duration: 1 – 600 Seconds per step
Ramp-down rate:
Programmable
Temperature
Radiation dependent
Range: 1 – 180°C Per second
Maximum: 150°C per second
Recommended steady-state temperature range: 400 – 1200°C
ERP Temperature accuracy: +5°C to -9°C
Calibrated against an instrumented thermocouple wafer (ITC)
Temperature repeatability: + 7°C
Temperature uniformity: + 10°C
Includes: Manuals.
AG ASSOCIATES 4100 is a rapid thermal processor designed for a variety of processing applications. This state-of-the-art equipment is designed for heatsinking, annealing and crystal growing. It has a temperature range from -50C to +800C, a sample footprint up to 14"x14" and a wafer pitch as low as 2mm. The system includes a proprietary Rapid Thermal Transfer Unit (RTTS) with a unique hot edge and cooling fins to ensure high temperature uniformity and rapid sample transfers. The machine features a robust controller with intuitive software that enables easy programming and high throughput operation. It also features a high-power infrared lamp that allows rapid temperature ramps and rapid cycle time. The entire tool is enclosed in a temperature and humidity controlled chamber to ensure repeatable process results. The asset utilizes a stainless steel heating element and offers the user custom heating profiles. It is also equipped with a thermal sensor mounted onto the substrate holder for monitoring the temperature of the sample. This allows the user to tailor the thermal profile to their application's needs. 4100 is a high-end model designed for research, production and industry. It offers a variety of different applications, including annealing and crystallization, diffusion, diffusion barrier deposition and impurity doping. It is also suitable for such applications as industrial furnace, reflow ovens and rapid thermal flashing. Overall, AG ASSOCIATES 4100 is a sophisticated tool designed for a variety of processing needs. It offers a versatile, temperature-controlled chamber and rapid thermal transfer equipment that allow rapid sample processing. With an intuitive controller and customizable heating profiles, this system is an ideal solution for a variety of research and industry needs.
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