Used AG ASSOCIATES Heatpulse 210 #170134 for sale
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ID: 170134
Wafer Size: Up to 4"
Rapid Thermal Processor Annealing System, up to 4"
Specifications:
Single wafer annealing with precision temperature control
Accommodates wafer sizes up to 4"
Operating temperature range of 400° to 1200°C
200/208 VAC, 50/60 Hz, 100 Amp
Controller not included.
AG ASSOCIATES Heatpulse 210 is a versatile rapid thermal processor (RTP). It has been designed to enable accurate, reliable and repeatable temperature control of various substrates (including, but not limited to, glass, gallium arsenide, and silicon). It has a broad temperature range (from 15° to 1200°C) and can handle large substrates up to 200mm in diameter. Heatpulse 210 is driven by a Bipolar AC supply and incorporates a leading-edge heated stage. It has an efficient heat transfer system, accurate feedback controllers, and a state-of-the-art touch control interface. In addition, a unique guide track allows for easy loading, longer and more stable process cycles and reliable setup repeatability. AG ASSOCIATES Heatpulse 210 has a simple yet efficient digital processing interface with advanced process control capabilities. This can be used to control and monitor the temperature of the substrates. It has a three-zone architecture for superior device protection and precise temperature uniformity. Users can adjust the heating/cooling rates according to the process requirements with the high-resolution step controllers or apply a user-defined recipe to control the temperature ramping and cooling rate. Heatpulse 210 comes with a comprehensive set of safety features. An over-temperature imager is used to detect any undesired heating of the substrate during the process. In addition, its particle-free environment meets or exceeds all purity requirements of the most demanding industries. AG ASSOCIATES Heatpulse 210 is a reliable, easy to use rapid thermal processor that provides precise temperature control and long-term repeatability. Its advanced control system, superior temperature uniformity and safety features make it an ideal choice for a variety of thermal processing applications.
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