Used AG ASSOCIATES Heatpulse 4108 #9146306 for sale
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ID: 9146306
Wafer Size: 5"-8"
Vintage: 1994
Rapid thermal processor annealing system, 5"-8"
Electronics
Mass-flow-controlled gas handling
Cooling
ULPA Filtration
Mechanical assemblies
Applications:
Silicon dielectric growth
Implant annealing
Glass re-flow
Silicide formation and annealing
Nitridation of metals
Contact alloying
Oxygen donor annihilation
Wafer handling: Automatic serial processing
Standard cassettes
Throughput: Process dependent
Ramp-up rate: Programmable
1 – 180°C Per second
Steady-state duration: 1 – 600 Seconds per step
Ramp-down rate: Programmable
1 – 180°C Per second
Ramp down rate is temperature
Radiation dependent
Maximum 150°C per second
Recommended steady-state temperature range: 400 – 1200°C
ERP Temperature accuracy:
+3°C to -7°C
Calibrated against an instrumented thermocouple wafer (ITC)
Temperature repeatability: + 3°C
Temperature uniformity: + 5°C
1994 vintage.
AG ASSOCIATES Heatpulse 4108 is a rapid thermal processor that delivers powerful thermal processing capabilities in a very compact package. This RTP system is primarily used in research and development laboratories to speed up the process of annealing and rapid thermal processing (RTP) of semiconductor wafers. Heatpulse 4108 is equipped with a Substrate heating chamber which makes it an ideal choice for temperature-sensitive applications such as annealing of thin film layers. The chamber features horizontally staggered tube-in-tube type heaters provide more uniform temperature distribution across the substrate surface and minimize the thermal gradient. The temperature uniformity is further optimized for a given application by the Automatic Temperature Profile (ATP) Tuning feature. This feature adjusts the heater power to optimize the heated area temperature as the substrate moves from full center housing area to the corners of the chamber. AG ASSOCIATES Heatpulse 4108 is equipped with software that provides fully automation control for the repeatable process targets for up to 96 processes. It also offers ethernet-based remote access for convenient operation from a workstation where users can monitor key parameters such as temperature/power/gas/time profiles, replicating a repeatable process from one wafer to the next. Heatpulse 4108 also includes several safety features. It has a backup power supply with automatic reconnection following power interruptions to ensure all data is protected from loss or corruption. The built in pressure regulator and isolation device helps to provide ultimate process reliability. In conclusion, AG ASSOCIATES Heatpulse 4108 is a powerful and reliable RTP system that provides excellent and repeatable thermal processing and annealing capabilities. Its small size combined with its extensive safety and control features make it a great choice for small scale, temperature-sensitive applications.
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