Used ALLWIN21 AW 901e #9201807 for sale
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ID: 9201807
Wafer Size: 3"-6"
Plasma etcher, 3"-6"
Wafer loading: 3-Axis robot
Stationary cassette plate
Plasma power: RF 13.56 MHz
Type: Parallel / Single wafer process
Stand alone
Gas lines: 1-3 Lines
Throughput: 30-60 WPH, Process dependent
Temperature: 6-65ºC (±2 ºC) Capability
Gas lines: (4) Gas lines with MFCs
Etcher rate:
AW-901eR: 0-8000A / minute
AW-903eR: 0-4000A / minute
Process dependent
Uniformity: Up to ±3%, Process dependent
Particulate: <0.05 / cm2
Selectivity:
901eR: 2-20:1
AW-903eR: 2-20:1
Process dependent
MTBF / MTTA / MTTR: 450 Hours / 100 Hours / 3.5 Hours
Options:
EOP Module with PCB
GEM/SECS II Function
Lamp tower alarm with buzzer
Throttle valve pressure control
Vacuum pump
Chiller for chuck and chamber
Through the wall
Main frame, standard
Pentium class PC with
Keyboard
Mouse
USB
SW Backup
Cables
Chuck:3"-6"
Wafer aligner / Cooling station
3-Axis integrated solid robot:
H-Zero (Standard)
H1-7 x 10.5 (TTW)
Fixed cassette station:
Chuck assembly
901eR Non-anodized
903eR Anodized with flat
903eR Anodized with flat
903eR Non-anodized with flat
Reactor Assembly:
901eR Non-anodized
903eR Anodized
903eR Non-anodized
903eR High performance
Direct cooling
Non direct cooling
Pins:
Quartz
Ceramic SST
Centering ring:
Aluminum
Ceramic
Main control board:
Gas box with (4) inline gas lines, MFC, filters, and pneumatic valves
RF Matching network with PCB
RF Generator: 13.56 MHz
MKS Elite: 300 HD
MKS Elite: 600 HD
MKS Elite: 1000 HD
ENI ACG 3
ENI ACG 10
AC / DC Box
ATM Sensor
UPC Pressure control
225 SCCM: 901eR
2000 SCCM: 903eR
MKS Baratron with peumatic Iiolation valve
Main vacuum valves
Front EMO interlocks
Touch screen GU, 15"
AW-901eR AW-903eR
Material etched Polysilicon / Nitride Oxide,SOG,Nitride
Main etchant gases SG6, O2 / SF6,O2 CHF3,SF6,He
Other gases CHCLF2 / None None
Pressure (mTorr) 200-450 / 250-350 1600-3000
RF Power (Watts) 100-250 / 200-300 400-600
Temperature (C) 30 / 30 23
AC Power:
AC Module: 200-240 VAC Selectable, 50/60 Hz, 3-wire single-phase
Temperature controller: 200-240 VAC, 50/60 Hz, 3-wire single-phase
Vacuum pump: 208-230 / 460 VAC, 60 Hz or 200-220 / 380 VAC, 50Hz, 3 Phase
RF Generator: 200-240 VAC
PC / Monitor: 115 VAC
Cabinet exhaust: 100 cfm.
ALLWIN21 AW 901e is a Rapid Thermal Processor (RTP) used for a variety of semiconductor and electronic device fabrication processes. It is a multi-zone equipment that combines high-speed sample loading/unloading, independent heating/cooling, precise temperature control, and optional hydrogen reduction capabilities. Its design allows the system to operate faster and more efficiently than conventional RTP systems, saving time and resources. AW 901e utilizes a Dynamic Optimization Control Unit (DOCS) which allows individual heating and cooling rates to be precisely adjusted according to the physical characteristics of the load. This ensures uniformity and repeatability of the process, regardless of the material being processed. It is also equipped with an on-board data acquisition machine and a variety of alarm functions, allowing detailed monitoring and recording of various aspects of the process. ALLWIN21 AW 901e utilizes a three-stage process to ensure accurate and repeatable heating and cooling. The first stage is temperature ramp, which quickly reaches the target temperature. The second stage is a soak cycle, which allows the sample to reach thermal equilibrium. This is followed by a rapid cooling process, which quickly reduces the temperature and prevents sample damage. AW 901e is designed to be user-friendly, with automatic recipes and sequence control settings that allow for quick and easy set-up of the entire process. It also features various safety functions such as a fan override and over-temperature detection. This allows for safe operation, and insures the accuracy of the process. ALLWIN21 AW 901e can be used for a variety of oxide removal, rapid temperature annealing, rapid cooling, curing, high temperature bake and brazing applications. Its flexible design allows for customization of the process, and a compact size allows for installation in a variety of locations. It is a reliable, cost-effective solution for many demanding applications.
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