Used ALLWIN21 AW B3000 #9201806 for sale
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ID: 9201806
Wafer Size: 8"
Plasma asher / Descum equipment, 8"
Production-proven plasma stripper
Consistent wafer-to-wafer uniformity
Main body with wires
Control box
Keyboard, mouse
Transformer, circuit breaker, contactor
Cables
EMO, interlocks and watchdog function
Quartz chamber: Diameter 12” x depth 23”
Main control: PCB and DC
Main body of tools:
RF Match network integrated
Chamber door with quartz plate
Gas and vacuum lines connections
Options:
End-of-process (EOP)
Throttle valve for pressure control
Air-cooled RF generator
Thermocouple: Chamber temperature
Vacuum pump
Lamp tower alarm with buzzer
Main vacuum valve
MKS Baratron
Throttle valve
Touch screen GUI, 15"
High throughput: Up to 75 WPH
Gas Lines: Up to 5 isolated gas lines with MFCs
Asher rate: 0-0.1u/min
Positive PR: >0.2u/min
Negative PR
Uniformity: Up to 25%
Particulate: <0.05 /cm2
Selectivity: >1000:1
MTBF / MTTA / MTTR: 450 Hours / 100 Hours / 3.5 Hours
Plasma power: Air-cooled RF 13.56MHz
TC Option:
N2 Plasma: Up to 170°C
Types:
Barrel / Batch
Desktop
Stand alone
Wafer loading: Manual.
ALLWIN21 AW B3000 is a rapid thermal processor designed for the highest quality of precision and accuracy. It utilizes advanced technology to provide a rapid thermal transfer from process to product and delivers superior control of temperature, time, and atmosphere for process control. The equipment features an advanced high temperature rapid thermal processor control, providing accurate thermal control during processing. AW B3000 supports process temperatures up to 2,700°C and a low noise environment for precision control. It also features a high protection design with a high temperature quench chamber for fast transfers. The processor incorporates an open-tube chamber design, allowing greater flexibility and control in terms of atmosphere during processing. ALLWIN21 AW B3000 is equipped with a direct heating system, allowing even heating throughout the processing chamber. It also ensures uniform temperature distribution at different levels of the chamber. The exact control and repeatability of temperatures is facilitated via a sophisticated temperature monitoring and control unit. It allows thermal control accuracy of +/- 1°C and time control accuracy of 0.001 second. To further ensure uniformity of temperature and fast reaction times, the temperature control machine is enhanced with an exposure shuttering tool. This asset also allows the user to accurately control the exposure time and number of exposures of each processing step. The model also includes customizable wafer lifters for fast loading and unloading of wafers and substrates. There is also an advanced automated wafer identification equipment, which allows for precise wafer loading and identification. Moreover, the system is equipped with automated data logging and reporting for real-time analysis and feedback. AW B3000 is a powerful and precise industry-standard rapid thermal processor. It offers superior precision, accuracy, and speed of processing, with advanced temperature control and reporting capabilities and customizable lift and suspension systems for easy wafer and substrate loading and unloading.
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