Used AMAT / APPLIED MATERIALS 0010-22033 #38964 for sale

AMAT / APPLIED MATERIALS 0010-22033 Rapid Thermal Processor (RTP) is a advanced semiconductor thermal processing device used for rapid heating and cooling of wafers. It enables fast, precise, repeatable and uniform heating and cooling of wafers in a very short time (3-5 seconds). The RTP is the only technology of its kind that is capable of maintaining temperatures greater than 1000°C without the use of high-power lamps. The design of the machine consists of two lower chambers for rapid heating and cooling of the wafer and one upper heated chamber for high temperature annealing. The wafers are placed over an RF induction coil, which is used to generate the desired thermal profile. During the heating/cooling cycle, the wafer is exposed to a volatile flow of inert gas (N2, Ar, & O2) and diazomethane gas which helps to create an environment for uniform annealing of the wafer. The chamber temperature is regulated by the controller chamber and is typically between 500 - 1200°C, with a maximum precision of ± 0.1°C. In addition, the RTP enables processes such as diffusion, oxidation and multi-stack metallization. This machine offers a high-performance automated system that is able to process up to 8 wafers simultaneously while achieving a cycle time as short as 20-25 seconds. The use of AMAT 0010-22033 RTP offers a great advantage due to its ability to produce reliable results at high throughput, while providing an improved platform for thermal process research and product development. Its advantages include superior spatial uniformity, repeatable and controllable processing, and reduced process cycle times. Additionally, its advanced automation capabilities, including material and gas delivery, as well as automatic wafer handling, reduce handling and contamination risks. These features of APPLIED MATERIALS 0010-22033 RTP make it an excellent choice for a wide range of thermal processing applications, including semiconductor device fabrication, integrated optoelectronic devices, and various nanostructure and microfabrication processes. The thermal processor is also able to provide superior rates of productivity with multiple wafer batches, standard and advanced recipes, as well as process batch tracking.