Used AMAT / APPLIED MATERIALS Centura 5200 #9206626 for sale

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ID: 9206626
Vintage: 1998
Rapid Thermal Processing (RTP) system LL Type: Wide body LL Pump LL Function test Chamber variant: MOD II XE+ ATM Ni Coated Centura HTF MF Chamber position: A and B Chiller RTP Chamber A/B PCV / Rotation / Lift test Chamber A/B temperature control test O2 Sensor: CG-1000 Bottom purge VME Controller Center finder: OTF Wafer mapping: Standard Robot: Frog (HP) Buffer chamber HP robot overhaul & test Pyrometers: SEKIDENKO Rotation: 90 RPM (Bearings) Cooldown: (2) Standard cool MFCs: N2: 10SLM O2: 1SLM Ar: 10SLM O2: 10SLM N2-BPSG: 20SLM 1998 vintage.
AMAT (APPLIED MATERIALS) AMAT / APPLIED MATERIALS Centura 5200 is a thermal processing reactor designed for semiconductor wafer fabrication processes. The reactor offers high-volume throughput, low cost of ownership and precise process control capabilities. It provides an ideal platform for creating a safe and efficient environment for semiconductor production. AMAT Centura 5200 is driven by an advanced Quad-Core processor and incorporates a sophisticated Automated Process Control (APC) system. APC delivers a dynamic pathway for rapid recipe development and recipe management. It also enables continuous, closed-loop control of the process to reach optimal process results, in terms of yield and product quality. APPLIED MATERIALS Centura 5200's thermal control is loaded with advanced features, such as the Quad-Flow uniformity system. This advanced feature ensures that the process temperature is evenly distributed across the susceptor. This ensures a uniform and repeatable process. The chamber also features Electrostatic Chuck (ESC) top plates, which secure the wafers during processing, eliminating die-to-die and die-to-chamber non-uniformity. Centura 5200 also features a PECVD chamber for providing a low temperature, high throughput solution for growing thin films. The PECVD chamber offers a wide range of selectable options, from Al and SiOx films, to TaN films and polysilicon films. The chamber also has the capability to grow films of different structures and thicknesses, for example for the fabrication of multiple layers of thin films. AMAT / APPLIED MATERIALS Centura 5200 can be integrated into a full automated production line, making it ideal for medium and high volume production. The reactor is wired for four-wire control, allowing the Centura to integrate with most process robots. Its advanced vacuum system ensures a high throughput, minimizing process time and achieving optimum process results. In summary, AMAT Centura 5200 is a state-of-the-art thermal processing reactor offering precise process control, high throughput, and cost savings in wafer fabrication processes. Its advanced features and integration capability make it a perfect solution for medium and high volume production lines.
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