Used AMAT / APPLIED MATERIALS Centura Radiance RPO #293591363 for sale

AMAT / APPLIED MATERIALS Centura Radiance RPO
ID: 293591363
Wafer Size: 12"
Rapid Thermal Processing (RTP) system, 12" Process: RPO (Remote Plasma Oxidation) (4) Chambers.
AMAT / APPLIED MATERIALS Centura Radiance RPO is a rapid thermal processor designed to enable high-throughput, high-temperature processing of advanced semiconductor devices. The Radiance RPO offers a unique combination of features to support leading-edge device development. Not limited to just traditional applications in shallow trench isolation, field oxide trim and polysilicon oxidation, the Radiance can be used for a wide range of applications such as Contact Etch Back, Metal Etch Back and PEALD (plasma enhanced atomic layer deposition). The Radiance comes with the standard features of a state-of-the-art rapid thermal processor, including an AGVP (Advanced Gas Valve Package) module, four independent reactor zones and a dual zone control for top and bottom susceptors. The integrated process management and monitoring system allows users to control wafer sheath temperature and time range, as well as gas flow rate and channel pressure. The system's automated data collection and process optimization capabilities foster repeatable, reliable and consistent processes with unprecedented repeatability, even on layered films, which greatly increases process scalability. For improved performance, the Radiance also comes with a full suite of automated temperature, time and cycling control features. Integrated pulsing capabilities control the time and temperature through multiple, discrete steps, allowing users to profile their process even more precisely. Additionally, internal gas management systems allow users to control and monitor gas introduction throughout the process, enabling greater process flexibility. The Radiance's advanced process technology offers unmatched precision for advanced wafer fabrication processes. The processor allows users to define and control process parameters accurately, allowing for precise thermal processes, exacting temperature and duration control, and finely-tuned process recipes. Moreover, the Radiance comes with a number of proprietary features designed to improve performance and enhance process recipe security, such as full-wake-up/shutdown process recipe, user-configurable uniformity limits and highly secure data storage and password authentication. In summary, AMAT Centura Radiance RPO is a rapid thermal processor designed to support a wide range of wafer fabrication processes and applications. The Radiance provides unparalleled precision, process scalability and flexibility, along with a set of proprietary features to maximize performance, process security and user experience.
There are no reviews yet