Used AMAT / APPLIED MATERIALS Vantage Radiance #293586616 for sale

ID: 293586616
Rapid Thermal Processing (RTP) system, 12" Process: RadOx (2) Chambers Wafer type: SNNF Platform type: Vantage 3.X Position A and B: (V352) RadOx2 Chamber A and B process: Toxic RP OHT WIP Delivery Dual 2-slot active cool down station E99 Docked reading capability Load port: SELOP 7 Load port operator interface: Standard (8) lights Configurable colored lights Top air intake system Upper E84 interface enabled OHT Upper E84 PIO sensors and cables E99 Carrier ID: TIRIS With RF Operator access switch 4-Color configurable light towers Interface A option Out the back connection type: RP Out the back connection H2 (2) Water cooling chambers RP Integration hardware: Chamber A and B Standard RAGB rear light tower Vantage skin: (2) Toxic chambers IPUP Transfer pump Open loop tuner MFC type: STEC Core anneal and RTO Monitor 1: Flat panel with keyboard on stand, 17" Monitor 2: Flat panel on stand, 17" Monitor 1 & 2 cables: 25 ft with 16 feet effective No RTP Abatement Unit SEMI F47 Semi S2 compliance RTP Chamber type: Radiance RadOx 2, 12" Technology option: Open loop tuner MFC Type: STEC Core anneal and RTO Rotation type: WRLD Toxic Low flow O2: 5 SLM High flow O2: 50 SLM Oxygen analyzer H2: High flow Low flow Side inject No process N2 for flammable MNFLD Gas pallet type: TOXIC RP Common gas pallet No MWBC improvement kit Chamber integration lines: RadOx2 RP Pump cable: 81 Feet Base ring: RadOx2 base ring Line 1 / N2 (N/O), 50 SLM Line 2 / O2, 50 SLM Line 3 / O2, 5 SLM Line 6 / H2, 15 SLM - side inject high flow Line 7 / H2, 22 SLM - high flow Line 8 / H2, 2 SLM - low flow Line 10 / N2 (P/P), 30 SLM Restrictor Line 11 / He, 30 SLM Line 12 / N2 (BP), 50 SLM Line 13 / N2 (Maglev), 100 SLM Docking station FST install kit Does not include Hard Disk Drive (HDD) 2013 vintage.
AMAT / APPLIED MATERIALS Vantage Radiance is a rapid thermal processor (RTP) used for semiconductor device fabrication. It produces rapid heating and cooling cycles that are critical for the commercial production of wafer-level devices. The RTP is a single-wafer rapid thermal annealing system that features a large quartz tube, an infrared lamp array and associated optics, and an adjustable platform for controlling the uniformity of the lamps' heating of the semiconductor layer. It has an effective process temperature range of 0°C to 900°C, a process time of 5-60 seconds, and a uniformity of +/-1°C across the wafer surface. AMAT Vantage Radiance uses sophisticated computer control and a hot-wall vacuum chamber to ensure temperature accuracy and environmental integrity. Its infrared lamps offer high intensity and uniform spatial and temporal irradiance, enabling excellent wafer-level uniformity. Its hot-wall vacuum design ensures a clean and contaminant-free environment, eliminating the need for nitrogen or helium atmosphere during processing, thus providing low cost-of-ownership and high efficiency. The RTP is designed to deliver high speed and repeatable annealing results with uniform temperature distribution, excellent wafer-level uniformity, and a wide range of process temperatures. It features advanced clean chamber technology, which provides improved process fidelity, repeatability, and performance for high-speed process optimization—including high-precision spectral matching for process optimization. APPLIED MATERIALS Vantage Radiance is also equipped with a broad array of diagnostic and control systems, providing real-time data regarding temperature, process time, and energy consumption. It includes features such as automated sample loading and wafer exchange, process and thermal cycle scheduling, and process verification. In addition, a unique diagnostic system provides process feedback and can be securely accessed remotely to oversee system performance and adjust the process parameters remotely. Vantage Radiance is a compact and rugged RTP designed for reliable production of high-performance semiconductor devices. Its low cost-of-ownership, high precision, and easy automation make it an ideal tool for semiconductor device production.
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