Used AMAT / APPLIED MATERIALS Vantage Radiance #293586616 for sale
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ID: 293586616
Rapid Thermal Processing (RTP) system, 12"
Process: RadOx
(2) Chambers
Wafer type: SNNF
Platform type: Vantage 3.X
Position A and B: (V352) RadOx2
Chamber A and B process: Toxic RP
OHT WIP Delivery
Dual 2-slot active cool down station
E99 Docked reading capability
Load port: SELOP 7
Load port operator interface: Standard (8) lights
Configurable colored lights
Top air intake system
Upper E84 interface enabled OHT
Upper E84 PIO sensors and cables
E99 Carrier ID: TIRIS With RF
Operator access switch
4-Color configurable light towers
Interface A option
Out the back connection type: RP
Out the back connection H2
(2) Water cooling chambers
RP Integration hardware: Chamber A and B
Standard RAGB rear light tower
Vantage skin: (2) Toxic chambers
IPUP Transfer pump
Open loop tuner
MFC type: STEC
Core anneal and RTO
Monitor 1: Flat panel with keyboard on stand, 17"
Monitor 2: Flat panel on stand, 17"
Monitor 1 & 2 cables: 25 ft with 16 feet effective
No RTP Abatement Unit
SEMI F47
Semi S2 compliance
RTP Chamber type: Radiance RadOx 2, 12"
Technology option: Open loop tuner
MFC Type: STEC
Core anneal and RTO
Rotation type: WRLD Toxic
Low flow O2: 5 SLM
High flow O2: 50 SLM
Oxygen analyzer
H2:
High flow
Low flow
Side inject
No process N2 for flammable MNFLD
Gas pallet type: TOXIC RP Common gas pallet
No MWBC improvement kit
Chamber integration lines: RadOx2
RP Pump cable: 81 Feet
Base ring: RadOx2 base ring
Line 1 / N2 (N/O), 50 SLM
Line 2 / O2, 50 SLM
Line 3 / O2, 5 SLM
Line 6 / H2, 15 SLM - side inject high flow
Line 7 / H2, 22 SLM - high flow
Line 8 / H2, 2 SLM - low flow
Line 10 / N2 (P/P), 30 SLM Restrictor
Line 11 / He, 30 SLM
Line 12 / N2 (BP), 50 SLM
Line 13 / N2 (Maglev), 100 SLM
Docking station FST install kit
Does not include Hard Disk Drive (HDD)
2013 vintage.
AMAT / APPLIED MATERIALS Vantage Radiance is a rapid thermal processor (RTP) used for semiconductor device fabrication. It produces rapid heating and cooling cycles that are critical for the commercial production of wafer-level devices. The RTP is a single-wafer rapid thermal annealing system that features a large quartz tube, an infrared lamp array and associated optics, and an adjustable platform for controlling the uniformity of the lamps' heating of the semiconductor layer. It has an effective process temperature range of 0°C to 900°C, a process time of 5-60 seconds, and a uniformity of +/-1°C across the wafer surface. AMAT Vantage Radiance uses sophisticated computer control and a hot-wall vacuum chamber to ensure temperature accuracy and environmental integrity. Its infrared lamps offer high intensity and uniform spatial and temporal irradiance, enabling excellent wafer-level uniformity. Its hot-wall vacuum design ensures a clean and contaminant-free environment, eliminating the need for nitrogen or helium atmosphere during processing, thus providing low cost-of-ownership and high efficiency. The RTP is designed to deliver high speed and repeatable annealing results with uniform temperature distribution, excellent wafer-level uniformity, and a wide range of process temperatures. It features advanced clean chamber technology, which provides improved process fidelity, repeatability, and performance for high-speed process optimization—including high-precision spectral matching for process optimization. APPLIED MATERIALS Vantage Radiance is also equipped with a broad array of diagnostic and control systems, providing real-time data regarding temperature, process time, and energy consumption. It includes features such as automated sample loading and wafer exchange, process and thermal cycle scheduling, and process verification. In addition, a unique diagnostic system provides process feedback and can be securely accessed remotely to oversee system performance and adjust the process parameters remotely. Vantage Radiance is a compact and rugged RTP designed for reliable production of high-performance semiconductor devices. Its low cost-of-ownership, high precision, and easy automation make it an ideal tool for semiconductor device production.
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