Used AMAT / APPLIED MATERIALS Vantage Radiance #293587171 for sale

AMAT / APPLIED MATERIALS Vantage Radiance is a rapid thermal processor that operates in a vacuum environment to efficiently process wafers for semiconductor device fabrication. The equipment uses advanced technology that enables temperature values to be precisely controlled during the rapid thermal processes. In addition, the system can convert materials to altered forms, including amorphous, polycrystalline, and single-crystal structures, as well as multi-layer structures. This can also be used to improve layer uniformity and microstructural properties. The main components of the Radiance unit include a loadlock chamber, a flash lamp, and a high vacuum frame. The loadlock chamber is the main area of the machine where the wafers are loaded and unloaded. The flash lamp is used to heat up the interior of the chamber, while the high vacuum frame maintains the vacuum environment. In addition, the tool includes advanced process control modules, which are used to monitor the temperature, pressure and other parameters during the rapid thermal processing. The asset has a maximum processing temperature of 1000 °C and can process up to 12 wafers in a single cycle. This allows for increased productivity and a faster cycle time. The model also features an industry standard wafer-handling equipment, with an automatic cassette-to-cassette transfer station, and automated alignment detection. This makes it easy to setup, operate, and maintain the system and results in improved reliability and performance. The Radiance unit uses advanced control technologies to ensure accuracy and repeatable results during each rapid thermal process. It includes a built-in feedback loop between the wafer temperature and the flash lamp intensity, allowing the machine to maintain a constant and consistent temperature across the entire surface of the wafer. This ensures consistent thermal processing results. In addition, the tool has a built in pressure monitoring asset that allows for an overall precision control. The Radiance model not only has the ability to rapidly convert materials to altered forms, but can also be used to rapidly anneal materials. This process can be used to reduce the crystalline defects, increase the contact resistance, and enhance the dopant activation within the desired depth of the material. Thus, the Radiance equipment is an excellent choice for semiconductor device manufacturers, due to its flexibility, accuracy, and reliability.