Used APSYSTEM Korona 1200+ #9270686 for sale

APSYSTEM Korona 1200+ is a Rapid Thermal Processor (RTP) designed to maximize throughput in many thin film applications. The equipment incorporates advanced process control technology, allowing it to be optimized for both repeatability and efficiency. The RTP utilizes the latest in quartz susceptor technology and is capable of process temperatures up to 1100°C. Korona 1200+ is optimal for processing small batches, variable substrates, and difficult materials, while maintaining excellent throughput and repeatability. The RTP utilizes a CMOS based controller with pure hardened software algorithms, allowing for tight temperature control within +/-2°C of the setpoint. The advanced PID algorithm in the controller allows the process to be stabilized and tuned for optimal efficiency, further enhancing the throughput of the system. The controller also offers a convenient ability to monitor the process in real time, as well as track historical trending for analysis and debugging purposes. The unit is designed with a compact footprint and robust construction, allowing for easy integration into existing semiconductor fabs, as well as space-constrained laboratory settings. The closed loop cooling cycle helps to dissipate heat more efficiently, while still maintaining the precise temperature control essential to RTP operations. Generally, APSYSTEM Korona 1200+ excels in wafer-level processing and complex thin-film process steps. Its flexibility in temperature ranges, rapid turn-around times, and VOC compliance have made it a popular choice in many diverse R&D and production settings. The machine also offers a wide range of process options, including rapid thermal programmed annealing, oxidation, nitridation, impurity annealing, and metalization/deposition. In conclusion, Korona 1200+ is a highly capable Rapid Thermal Processor, offering efficient and repeatable processing for numerous thin film applications. Its robust feature set, coupled with the advanced software algorithms, makes for a solution that can reliably handle heat sensitive substrates with superior throughput.