Used APSYSTEM Korona 1200+ #9270851 for sale

APSYSTEM Korona 1200+ is a rapid thermal processor designed for thermal processing of wafers and substrates in a wide variety of applications. This powerful equipment offers superior process control, fast cycle times, high temperature accuracy, low thermal cycling, and extremely low thermal overshoot to produce highly repeatable results. The system consists of a powerful rapid thermal processor chamber, rapid thermal control unit, and multiple control/sensing systems. The rapid thermal processor chamber operates under high vacuum to provide a clean, highly repeatable thermal environment. The chamber, heated by eight hot zoned segments, uses nitrogen or argon to rapidly heat and cool substrates with high fuel efficiency. The precision temperature control unit combines advanced control algorithms with temperature sensors around the wafer to maintain uniform temperatures across the wafer. The on-board control/sensing systems provide an operator interface for programming and monitoring of the temperature profile. Using Korona 1200+'s graphical user interface, operators can monitor temperature information in real time and have access to measured and stored thermal data from stored recipes. Real-time temperature data can be used to check the accuracy of a thermal cycle or reveal non-operational conditions. APSYSTEM Korona 1200+ is precision constructed, with electrically isolated heating elements and an integrated microelectronic control machine, in order to provide highly precise thermal cycles in a wide variety of substrate sizes and thickness ranges. The precise temperature control ensures that the desired effects are achieved during thermal processing. Korona 1200+ is designed to provide rapid thermal processing capabilities for a variety of production requirements. Its advanced control and monitoring systems, superior process control, precise temperature control, and fast cycle times make it a popular choice for operations that require consistent, repeatable results.