Used APSYSTEM KORONA-1200P #293610309 for sale

APSYSTEM KORONA-1200P is a state-of-the-art rapid thermal processor (RTP) designed for processing semiconductor wafers in an industrial setting. KORONA-1200P utilizes precision-engineered ceramic heating elements for temperatures up to 1200°C, providing optimal performance and thermal accuracy. APSYSTEM KORONA-1200P is equipped with advanced safety features and digital process controls which allow the user to accurately monitor and adjust the temperature profile during each thermal cycle. KORONA-1200P features a double-walled insulated chamber made of high-grade steel and aluminum alloy. This chamber is designed to provide uniform temperature and pressure equalization inside, allowing it to achieve high-temperature processes with minimal temperature gradients. The chamber also employs a forced air-cooling equipment to ensure quick temperature recovery between cycles and maximize throughput. APSYSTEM KORONA-1200P also includes a compact process gas delivery system for optimal gas injection into the reaction chamber. The unit is comprised of a manually adjustable process gas flow rate, a built-in mass flow meter, and a filter train for protection from particulate contamination. The machine provides accurate and repeatable process conditions, allowing the user to precisely control the chemical reactions taking place in the chamber. KORONA-1200P's user interface is designed to provide intuitive operation and parameters adjustment. The user has full control over the chamber temperature and pressure, process gas flow rate, and process timing. The user can also adjust the temperature profile for each process using the chamber configuration software, allowing the user to maximize repeatability and yield. In summary, APSYSTEM KORONA-1200P is an industrial-grade RTP designed to provide unparalleled performance and total in-process control. Its chamber configuration software, precision-engineered ceramic heating elements, and digitally controlled process parameters give the user the ability to process wafers with consistent, repeatable high-performance results.