Used APSYSTEM KORONA-1200P #9270852 for sale

APSYSTEM KORONA-1200P is a rapid thermal processor that is designed to provide highly precise thermal processing for a variety of different materials and substrates. Used primarily in the semiconductor industry, KORONA-1200P is a cost-effective solution for processing many small substrates. APSYSTEM KORONA-1200P is capable of producing superior surface uniformity across substrates, with hot spots of less than 2% deviation during typical processing. It uses a gas-catalytic effusion source to rapidly heat substrates up to 1,200 degrees Celsius and cool them back down in a matter of seconds. It is designed to operate in a fast-heating temperature profile with high accuracy thanks to the use of a patented thermal control system. KORONA-1200P has a number of features designed for flexibility and precise control. It features variable power input to adjust the heat rate, as well as programmable gas flow to deliver exact amounts of material to substrates for precise uniformity. This allows for process consistency over a wide range of temperatures. Additionally, the processor is equipped with absolute pressure and temperature monitoring to ensure every process turn out the same. APSYSTEM KORONA-1200P is also equipped with safety features to protect the user and the equipment. It has a thermal limit system which prevents overheating and automatically shuts the processor down if it detects dangerous temperatures. The processor also has an optical interlock which requires the use of safety glasses to be worn during operation. KORONA-1200P provides a reliable solution for rapid thermal processing and is ideal for a wide range of applications. It is capable of producing highly uniform surfaces with excellent repeatability, while also having the flexibility to be adjusted for different substrates and processes. This makes it an ideal solution for semiconductor processing.