Used APSYSTEM KORONA-1200P #9314987 for sale

APSYSTEM KORONA-1200P is an innovative rapid thermal processor (RTP) with a maximum processing temperature of 1200°C. This high-tech equipment is designed for producing an efficient and uniform heating of wafers, photoresist and dielectrics. Featuring superior temperature uniformity of ± 2 °C, KORONA-1200P ensures precise and accurate control of time and temperature. With a standard chamber size of 150 x 150 mm, and the optional large chamber size of 200 x 200 mm, APSYSTEM KORONA-1200P is capable of accommodating a broad range of substrates. It is compatible with a variety of fluorocarbon gas chemistries and can be programmed for automatic operation. Its spacious work chamber and efficient convective cooling system makes it ideal for processing wafers up to 5" diameter. Furthermore, KORONA-1200P features an impressive 4 ramps with up to 8 segments of temperature adjustment. Its ability to deliver rapid heat up/ and cool down times ensures fast and consistent perfect results. Its intuitive user interface with a wide range of useful settings easily allows the user to adjust the thermal profile for optimized processes. APSYSTEM KORONA-1200P also has advanced safety features to prevent contamination. An integrated low-leak metal seal unit isolates the chamber from the environment, keeping environmental pollutants out. The core of this machine uses a combination of quartz and heat transfer plate design to deliver superior temperature uniformity and process uniformity. Overall, KORONA-1200P is a reliable rapid thermal processor designed to provide excellent temperature uniformity and precise control for wafer processing. The combination of rapid heating/cooling times, high temperature capabilities, and intuitive user interface make it the ideal choice for researchers working on semiconductor wafers.