Used MATTSON HELIOS #9378666 for sale

MATTSON HELIOS
ID: 9378666
Wafer Size: 12"
Vintage: 2006
Rapid Thermal Processor (RTP), 12" 2006 vintage.
MATTSON HELIOS is a rapid thermal processor (RTP) designed for automated processing of a wide range of substrates. RTP systems are used in a variety of applications, including electronics manufacturing, biomedical device fabrication, and nano-electronic device fabrication. The RTP equipment consists of several elements that work together to rapidly and accurately process a substrate. The primary components of an RTP system include a controller, a preheater (or preheat source), heater plates, susceptor, vacuum chuck, heat exchanger and gas delivery. The controller is used to set temperatures for each of the components, and can vary processing parameters such as temperature, pressure, and gas flow rate. The controller also provides external interfaces for monitoring, control, and communication purposes. The preheat source heats the substrate surface to a specific temperature prior to each processing step to produce a homogeneous temperature throughout the material. This is usually done through the use of electrical resistance heaters, HELIOS preheat source uses an infrared lamp. The heater plates provide energy to the substrate during the process. MATTSON HELIOS utilizes microwave, convection, and ohmic heating to ensure rapid and even heating of the substrate. The susceptor, mounted on the lower side of the heater plates, is used to hold the substrate during processing. HELIOS susceptor uses ceramic material with high thermal conductivity for efficient heat transfer. The vacuum chuck is used to hold the susceptor and substrate in place, as well as provide vacuum seals to create a vacuum chamber. MATTSON HELIOS utilizes a 3-point support vacuum chuck unit for precise alignment of the substrate. The heat exchanger cools down the temperature of the substrate after processing, preventing thermal damage or overprocessing of the samples. HELIOS heat exchanger uses a combination of convection, conduction, and radiative cooling for efficient cooling. Finally, the gas delivery machine provides inert gases or reactive gases to the process chamber, ensuring the right atmosphere for the process. MATTSON HELIOS utilizes a multi-stage gas delivery tool that allows for precise control over the flow, pressure, and type of gases used. HELIOS is a powerful and reliable RTP for rapid and accurate substrate processing. Its combination of preheat source, heater plates, susceptor, vacuum chuck, heat exchanger, and gas delivery asset makes it an ideal solution for precision substrate processing.
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